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- W2068220352 abstract "This paper describes an interactive visualisation CAD package, XPROX, which has been developed to simulate and visualise the exposures of submicron pattern features in E-beam lithography. XPROX provides visualisation and iterative proximity correction for different pattern shapes and exposure conditions. For patterns comprising a large number of shapes, where there is a need to identify the proximity effect in critical areas quickly and automatically, a technique is described using XPROX whereby only the critical areas are proximity corrected, thus saving significantly on computing resources and data preparation time." @default.
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- W2068220352 title "A visualisation and proximity correction tool for submicron E-beam lithography" @default.
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- W2068220352 doi "https://doi.org/10.1016/0167-9317(95)00196-4" @default.
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