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• W2068280573 abstract "The relative density of O atom of Ar–O2 remote plasma excited in a low-pressure 13.56 MHz hollow cathode discharge system has been investigated. The measurements were carried out at a total pressure of 0.05 mbar, radiofrequency (RF) power of 200 W and at three different axial distances in the plasma chamber below the outlet of the discharge source. Using optical emission spectroscopy (OES), the relative density of O ground state was determined from intensity ratio of O(844.6 nm) and Ar(750.4 nm) lines. The electron temperature and O2+ densities have been measured using double langmuir probe measurements. The kinetic study of Ar–O2 plasma, combined with both spectroscopy and langmuir probe measurements, revealed that the main production mechanism of the excited O(3pP3) is direct excitation by electron impact. A maximum of O ground state relative density and correspondingly a minimum of O2+ density are obtained for the ratio O2/Ar:60/40. The maximum O density in the remote zone is found to be 4.5 times higher than at the outlet of source." @default.
• W2068280573 created "2016-06-24" @default.
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• W2068280573 date "2007-09-01" @default.
• W2068280573 modified "2023-09-27" @default.
• W2068280573 title "Diagnostic study of low-pressure Ar– remote plasma generated in HCD-L 300 system: Relative density of O atom" @default.
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• W2068280573 doi "https://doi.org/10.1016/j.vacuum.2007.04.031" @default.
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