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• W2068292110 abstract "Abstract Photosensitive TiO2/organically modified silane hybrid films were prepared by combining a low-temperature sol–gel process with a spin-coating technique. Optical properties and photochemical activities of the as-prepared hybrid sol–gel films under different UV irradiation time were characterized and monitored by prism coupling technique, UV–visible spectroscopy, and Fourier transform infrared spectroscopy. Surface morphology of the hybrid films was also observed by an atomic force microscopy. Advantages for fabrication of ridge waveguide structure based on the photosensitive hybrid films were demonstrated by an ultraviolet soft imprint technique. Effects of imprint force, imprint time, and UV irradiation time on high replication fidelity of the ridge waveguide structure were also investigated. An altitude replication fidelity of 99.7% can be obtained when the imprint force of 2 MPa, imprint time of 30 min and UV irradiation time of 45 min were chosen. Scanning electron microscopy and surface profiler were used to characterize the morphological and surface profile properties of the as fabricated ridge waveguide structure. Results indicate that the as-prepared photosensitive hybrid materials have great applicability for the fabrication of micro-optical elements and advantage as the imprint layer under the ultraviolet soft imprint technique." @default.
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• W2068292110 date "2013-03-01" @default.
• W2068292110 modified "2023-10-18" @default.
• W2068292110 title "Fabrication of ridge waveguide structure from photosensitive TiO2/ormosil hybrid films by using an ultraviolet soft imprint technique" @default.
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• W2068292110 doi "https://doi.org/10.1016/j.tsf.2012.12.073" @default.
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