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• W2068295611 abstract "In order to improve the efficiency uniformity of large-aperture beam sampling gratings (BSGs), a conventional chemical mechanical polishing (CMP) process of fused silica by CeO₂ slurry is proposed to modify their groove profiles. With the proposed CMP process, the efficiency uniformity of several BSGs with an aperture of 430 mm×430 mm has been successfully controlled within an rms of 5%. The proposed CMP process is an effective method to improve the efficiency uniformity of large-aperture BSGs. Using the proposed CMP process, the requirement of the uniformity of the holographic ion beam etching process can be released in the realization of large-aperture BSGs." @default.
• W2068295611 created "2016-06-24" @default.
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• W2068295611 date "2014-02-20" @default.
• W2068295611 modified "2023-09-26" @default.
• W2068295611 title "Chemical mechanical polishing to improve the efficiency uniformity of beam sampling grating" @default.
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• W2068295611 doi "https://doi.org/10.1364/ao.53.001221" @default.
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