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• W2068351663 abstract "The effect on the intrinsic stress in AlN films of applying pulsed bias during cathodic arc deposition has been studied. We find that the stress depends only on the pulse voltage–pulse frequency product, V f. The form of the dependence is well fitted by an exponential function whose parameters can be interpreted physically. The preferred orientation changes progressively with V f, from hexagonal crystallites having their direction in the plane of the film at low V f, to hexagonal crystallites having their direction normal to the plane of the film at high V f. The in-plane orientation may be consistent with energy minimization in a biaxial stress field whereas the normal orientation is consistent with the alignment of a channelling direction with the ion beam." @default.
• W2068351663 created "2016-06-24" @default.
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• W2068351663 date "2004-03-01" @default.
• W2068351663 modified "2023-10-16" @default.
• W2068351663 title "Stress relief and texture formation in aluminium nitride by plasma immersion ion implantation" @default.
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• W2068351663 doi "https://doi.org/10.1088/0953-8984/16/10/007" @default.
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