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- W2068356768 abstract "By alternating the deposition of a several-angstrom-thick hydrogenated amorphous silicon layer and the exposure to a hydrogen plasma, the structure of the resultant hydrogenated silicon films is varied from device-grade amorphous to microcrystalline without any change in the film precursors. On the basis of experimental results, the effects of hydrogen atoms reaching the film-growing surface on the Si-Si network structure are discussed." @default.
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- W2068356768 title "Effects of hydrogen atoms on the network structure of hydrogenated amorphous and microcrystalline silicon thin films" @default.
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- W2068356768 doi "https://doi.org/10.1063/1.102736" @default.
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