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• W2068499256 startingPage "014046" @default.
• W2068499256 abstract "Deuterium retention in tungsten films deposited on polycrystalline bulk tungsten substrates was investigated and compared with deuterium retention in W films deposited on silicon and in polycrystalline bulk W alone. The structure of the deposited films was investigated by x-ray diffraction and scanning electron microscopy combined with focused ion beam cutting. D retention after implantation was measured by nuclear reaction analysis and temperature programmed desorption (TPD). The W films deposited on bulk W show a typical columnar epitaxial growth. After D implantation, high densities of blisters with diameters of about a hundred μm were formed. Interestingly, the blisters are located within the W substrate well below the interface of deposited film and substrate. TPD spectroscopy reveals two D2 release peaks at 510 and 700 K, indicating at least two different trap energies." @default.
• W2068499256 created "2016-06-24" @default.
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• W2068499256 date "2014-04-01" @default.
• W2068499256 modified "2023-10-16" @default.
• W2068499256 title "Deuterium retention in tungsten films deposited by magnetron sputtering" @default.
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• W2068499256 doi "https://doi.org/10.1088/0031-8949/2014/t159/014046" @default.
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