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- W2068603995 abstract "Abstract The SiO 2 /Si (3 nm)/SiO 2 layers were deposited by e-beam evaporation, and ion-beam-mixing was performed with 1.5 × 10 16 ions/cm 2 of 55 keV at room temperature. The sample deposited by e-beam evaporation needs the pre-annealing before ion-beam-mixing as well as the post-annealing after ion-beam-mixing to obtain the nanocrystal-related photoluminescence, compared with the study of the sample deposited by ion beam sputtering which was not required the pre-annealing before ion-beam-mixing to obtain visible red photoluminescence. The pre-annealing effect on the photoluminescence of Si ion-beam-mixed SiO 2 /Si (3 nm)/SiO 2 layer will be discussed." @default.
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- W2068603995 date "2004-02-01" @default.
- W2068603995 modified "2023-09-27" @default.
- W2068603995 title "Visible photoluminescence from Si ion-beam-mixed SiO2/Si/SiO2 layers deposited by e-beam evaporation" @default.
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- W2068603995 doi "https://doi.org/10.1016/j.nimb.2003.11.059" @default.
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