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- W2068650884 abstract "We have studied the influence of amorphous and crystalline substrate materials, such as a-Si and a-Si:H, as well as c-Si(111), (100), and hydrogen implanted c-Si(111) on the outdiffusion of Si through an evaporated Au thin film, and its subsequent oxidation in atmosphere. Using Auger electron spectroscopy depth profiling we observed that the SiO2 layer thickness d formed on top of the Au film strongly depends on the type of substrate material giving most enhanced Si outdiffusion from amorphous ones. The metastable phase AuxSi is detected on both interfaces between the Au/Si and the SiO2/Au layers. A temperature independent ratio, dH/d ≊ 2, is observed for the oxide layer thickness of substrates with and without hydrogen. This is a surprising result, which indicates the influence of nonthermodynamic effects, probably related to the surface structure of the semiconductor substrates and a strong influence of hydrogen. A model of the layer structure is developed, which permits the calculation of diffusion activation energies resulting in qHD ≂ qD ≂ 1.0 (eV) for the diffusing species on substrates with and without hydrogen, respectively." @default.
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- W2068650884 date "1992-03-01" @default.
- W2068650884 modified "2023-10-14" @default.
- W2068650884 title "Au/Si interface: Experiments on substrate influence" @default.
- W2068650884 doi "https://doi.org/10.1116/1.578059" @default.
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