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- W2068756951 abstract "Annealing Ni/Ti multilayer thin films in order to achieve better composition control of the resultant NiTi shape memory thin films is proposed. To avoid furnace annealing, we numerically investigate the feasibility of using a laser to heat the thin films. It is demonstrated that use of a CO2 laser can be an efficient approach for annealing Ni/Ti multilayer thin films. It is suggested that a Ti layer should be deposited first on a silicon substrate for better absorption of laser energy and adhesion. As the high temperature area can be confined within the micron scale, it is fully compatible with the current IC/MEMS processing techniques." @default.
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- W2068756951 date "2005-10-17" @default.
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- W2068756951 title "Numerical investigation of CO2laser heating for annealing Ni/Ti multilayer thin films" @default.
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- W2068756951 doi "https://doi.org/10.1088/0964-1726/14/6/024" @default.
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