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- W2068807746 abstract "Based on first-principles density-functional calculations, we propose N-associated defects at $mathrm{Si}∕mathrm{Si}{mathrm{O}}_{2}$ interface, which behave as dominant interface states in Si oxynitrides instead of conventional ${P}_{b}$ centers in pure $mathrm{Si}{mathrm{O}}_{2}$. These defects involve an N interstitial, and their energy levels lie in the broad range, from the midgap to the conduction-band edge of Si, depending on local oxidation status near N, while electrical states from ${P}_{b}$-type centers are removed by substitutional N atoms. Our results provide a mechanism for degradations related to the interface defects in Si oxynitrides which are used in state-of-the-art metal-oxide-semiconductor devices." @default.
- W2068807746 created "2016-06-24" @default.
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- W2068807746 date "2008-03-10" @default.
- W2068807746 modified "2023-09-25" @default.
- W2068807746 title "Nitrogen-induced interface defects in Si oxynitride" @default.
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- W2068807746 doi "https://doi.org/10.1103/physrevb.77.104108" @default.
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