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- W2068854501 abstract "The interface quality of multilayer thin-film systems is of great interest for both the understanding of the physical properties which result from the loss of symmetry at the interfaces and for application purposes. We describe a technique which uses high-energy electron radiation (300 keV) from a conventional transmission electron microscope to characterize in a scattering experiment the interface quality of such multilayer systems. The technique is based on the use of high-energy electrons, with a correspondingly large k-vector k, which leads to a Ewald sphere with radius . This Ewald sphere can for many practical purposes be approximated by a plane. Therefore, the information obtained in a scattering experiment is restricted to a plane perpendicular to the primary beam, i.e. parallel to the multilayer structure, when the electrons pass through the multilayer system along its normal vector. When pair distribution functions (pdfs) are calculated from the scattered intensities, information can be gained about the coordination of pairs of atoms of different kinds within a plane parallel to the multilayer structure only. This information can then be used to determine whether the atoms at the interfaces between layers of different types of atom inside the multilayer stack are intermixed or not intermixed on an atomic scale. The technique is described, and its use is demonstrated on an multilayer system which has been prepared in order to create both sharp interfaces and interfaces which are intermixed. A comparison with an amorphous alloy of the same nominal composition is also given." @default.
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- W2068854501 date "1996-02-05" @default.
- W2068854501 modified "2023-09-26" @default.
- W2068854501 title "Discrimination between rough and smooth interfaces of multilayers inside a multilayer stack using high-energy electron scattering" @default.
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- W2068854501 doi "https://doi.org/10.1088/0953-8984/8/6/006" @default.
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