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- W2068973913 abstract "Molecular beam epitaxy has been used to grow Ga 1-x In x Sb in the entire compositional range. Good Hall mobility values were obtained, but the surfaces were rough and exhibited square defects. The X-ray diffraction Bragg peaks in the middle of the compositional range were broadened due to the disorder inherent in the alloy. A small inclination of the epitaxial layers with respect to the substrate was also found in this region." @default.
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- W2068973913 date "1997-05-01" @default.
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- W2068973913 title "Molecular-beam-epitaxial growth of Ga1−xInxSb on GaAs substrates" @default.
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- W2068973913 doi "https://doi.org/10.1016/s0022-0248(96)00978-5" @default.
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