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- W2069137776 abstract "E. Barouch, B. Bradie and S.V. BabuClarkson University, Departments of Mathematics and Computer Science and Chemical EngineeringPotsdam, New York 13676ABSTRACTThe least action principle algorithm is extended to model the development of a three dimensional latentimage in an exposed resist The photoactive compound (PAC) concentration is determined in a model resistfilm from the exact solution of Dill's equations for the exposure -bleaching process for the case of a matchedsubstrate. The procedure is valid for all mask shapes and is illustrated with an elliptical symmetry imposedupon the incident light intensity. Utilizing these PAC gradients, the three dimensional least action principlealgorithm is employed to compute developed resist profiles.1. INTRODUCTIONAccurate simulation of developed positive photoresist profiles is an integral part of the optimizationprocess for improved photoresist performance in VLSI lithography. For two dimensional profile simulations,the two most widely used general lithographic simulation systems, SAMPLE1 and PROLITH2, employ thestring development algorithm3. Recently, a new development algorithm, which is based upon the principle" @default.
- W2069137776 created "2016-06-24" @default.
- W2069137776 creator A5013475838 @default.
- W2069137776 creator A5049517742 @default.
- W2069137776 creator A5076078763 @default.
- W2069137776 date "1989-08-22" @default.
- W2069137776 modified "2023-10-05" @default.
- W2069137776 title "Three Dimensional Profile Simulation For Positive Photoresists" @default.
- W2069137776 cites W1968432763 @default.
- W2069137776 cites W1983083914 @default.
- W2069137776 cites W2021814749 @default.
- W2069137776 cites W2080579647 @default.
- W2069137776 cites W2087155860 @default.
- W2069137776 cites W2095871743 @default.
- W2069137776 cites W2107596116 @default.
- W2069137776 cites W2142081503 @default.
- W2069137776 cites W570927557 @default.
- W2069137776 doi "https://doi.org/10.1117/12.953062" @default.
- W2069137776 hasPublicationYear "1989" @default.
- W2069137776 type Work @default.
- W2069137776 sameAs 2069137776 @default.
- W2069137776 citedByCount "4" @default.
- W2069137776 crossrefType "proceedings-article" @default.
- W2069137776 hasAuthorship W2069137776A5013475838 @default.
- W2069137776 hasAuthorship W2069137776A5049517742 @default.
- W2069137776 hasAuthorship W2069137776A5076078763 @default.
- W2069137776 hasConcept C41008148 @default.
- W2069137776 hasConceptScore W2069137776C41008148 @default.
- W2069137776 hasLocation W20691377761 @default.
- W2069137776 hasOpenAccess W2069137776 @default.
- W2069137776 hasPrimaryLocation W20691377761 @default.
- W2069137776 hasRelatedWork W1596801655 @default.
- W2069137776 hasRelatedWork W2130043461 @default.
- W2069137776 hasRelatedWork W2350741829 @default.
- W2069137776 hasRelatedWork W2358668433 @default.
- W2069137776 hasRelatedWork W2376932109 @default.
- W2069137776 hasRelatedWork W2382290278 @default.
- W2069137776 hasRelatedWork W2390279801 @default.
- W2069137776 hasRelatedWork W2748952813 @default.
- W2069137776 hasRelatedWork W2899084033 @default.
- W2069137776 hasRelatedWork W2530322880 @default.
- W2069137776 isParatext "false" @default.
- W2069137776 isRetracted "false" @default.
- W2069137776 magId "2069137776" @default.
- W2069137776 workType "article" @default.