Matches in SemOpenAlex for { <https://semopenalex.org/work/W2069169611> ?p ?o ?g. }
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- W2069169611 endingPage "704" @default.
- W2069169611 startingPage "697" @default.
- W2069169611 abstract "Numerous alternate processes are under industry wide evaluation as simplifications to current double patterning methods. Reduction in process complexity and cost may be achieved by use of track-based photoresist stabilization methods that eliminate one etch step by allowing a second resist to be patterned over a first resist pattern. Here, we describe studies of 172nm flood UV exposure as one example of a resist stabilization method. When properly implemented, we observe that 172nm stabilization allows superior retention of photoresist profiles vs. longer wavelength UV treatment. For the commercial 193nm photoresist studied, judicious choice of 172nm dose and subsequent bake is required for pattern stabilization to second resist processing. FT-IR studies indicate that distinct chemical processes occur during 172nm flood exposure and subsequent bake: 172nm flood exposure appears to cause selective decarboxylation of lactones present in the photoresist, while baking leads to photoacid-mediated loss of blocking groups and other processes that are not conclusively characterized at present. At 800 mJ/cm2 172nm dose, resist patterns are sufficiently stabilized to prevent reflow in the subsequent bake. Approximately 25% volumetric shrinkage accompanies 172nm stabilization. This shrinkage is manifested as controllable CD trimming and thickness loss as well as 3-dimensional resist pattern distortion including line-end tilting and corner bowing. At insufficient 172nm cure doses, photoresist reflow occurs during the subsequent stabilizing bake. 3-Dimensional resist pattern distortions are dramatically larger under these conditions. These findings indicate that shrinkage control during any stabilizing process is a critical factor in resist design for simplified double patterning methods." @default.
- W2069169611 created "2016-06-24" @default.
- W2069169611 creator A5006820010 @default.
- W2069169611 creator A5021551685 @default.
- W2069169611 creator A5032634139 @default.
- W2069169611 creator A5040932462 @default.
- W2069169611 creator A5051395236 @default.
- W2069169611 creator A5088529412 @default.
- W2069169611 date "2008-01-01" @default.
- W2069169611 modified "2023-09-24" @default.
- W2069169611 title "A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure" @default.
- W2069169611 cites W1964950530 @default.
- W2069169611 cites W1970364747 @default.
- W2069169611 cites W1979915016 @default.
- W2069169611 cites W1996426988 @default.
- W2069169611 cites W2001350993 @default.
- W2069169611 cites W2014791485 @default.
- W2069169611 cites W2019346816 @default.
- W2069169611 cites W2020453378 @default.
- W2069169611 cites W2025991261 @default.
- W2069169611 cites W2030132672 @default.
- W2069169611 cites W2031495787 @default.
- W2069169611 cites W2036754884 @default.
- W2069169611 cites W2063896644 @default.
- W2069169611 cites W2070089441 @default.
- W2069169611 cites W2071050051 @default.
- W2069169611 cites W2072411676 @default.
- W2069169611 cites W2084501411 @default.
- W2069169611 cites W2087748769 @default.
- W2069169611 cites W2088251483 @default.
- W2069169611 cites W2088399353 @default.
- W2069169611 cites W2089594387 @default.
- W2069169611 cites W2098559938 @default.
- W2069169611 cites W2155872285 @default.
- W2069169611 cites W2159688300 @default.
- W2069169611 cites W1980513320 @default.
- W2069169611 cites W2033133527 @default.
- W2069169611 doi "https://doi.org/10.2494/photopolymer.21.697" @default.
- W2069169611 hasPublicationYear "2008" @default.
- W2069169611 type Work @default.
- W2069169611 sameAs 2069169611 @default.
- W2069169611 citedByCount "10" @default.
- W2069169611 countsByYear W20691696112016 @default.
- W2069169611 countsByYear W20691696112020 @default.
- W2069169611 crossrefType "journal-article" @default.
- W2069169611 hasAuthorship W2069169611A5006820010 @default.
- W2069169611 hasAuthorship W2069169611A5021551685 @default.
- W2069169611 hasAuthorship W2069169611A5032634139 @default.
- W2069169611 hasAuthorship W2069169611A5040932462 @default.
- W2069169611 hasAuthorship W2069169611A5051395236 @default.
- W2069169611 hasAuthorship W2069169611A5088529412 @default.
- W2069169611 hasBestOaLocation W20691696111 @default.
- W2069169611 hasConcept C134406635 @default.
- W2069169611 hasConcept C159985019 @default.
- W2069169611 hasConcept C171250308 @default.
- W2069169611 hasConcept C180145272 @default.
- W2069169611 hasConcept C192562407 @default.
- W2069169611 hasConcept C2779227376 @default.
- W2069169611 hasConcept C49040817 @default.
- W2069169611 hasConcept C53524968 @default.
- W2069169611 hasConceptScore W2069169611C134406635 @default.
- W2069169611 hasConceptScore W2069169611C159985019 @default.
- W2069169611 hasConceptScore W2069169611C171250308 @default.
- W2069169611 hasConceptScore W2069169611C180145272 @default.
- W2069169611 hasConceptScore W2069169611C192562407 @default.
- W2069169611 hasConceptScore W2069169611C2779227376 @default.
- W2069169611 hasConceptScore W2069169611C49040817 @default.
- W2069169611 hasConceptScore W2069169611C53524968 @default.
- W2069169611 hasIssue "5" @default.
- W2069169611 hasLocation W20691696111 @default.
- W2069169611 hasOpenAccess W2069169611 @default.
- W2069169611 hasPrimaryLocation W20691696111 @default.
- W2069169611 hasRelatedWork W2050480266 @default.
- W2069169611 hasRelatedWork W2062108412 @default.
- W2069169611 hasRelatedWork W2086621770 @default.
- W2069169611 hasRelatedWork W2088899554 @default.
- W2069169611 hasRelatedWork W2146470476 @default.
- W2069169611 hasRelatedWork W2158093578 @default.
- W2069169611 hasRelatedWork W2243245267 @default.
- W2069169611 hasRelatedWork W2523543017 @default.
- W2069169611 hasRelatedWork W2542251325 @default.
- W2069169611 hasRelatedWork W3131726586 @default.
- W2069169611 hasVolume "21" @default.
- W2069169611 isParatext "false" @default.
- W2069169611 isRetracted "false" @default.
- W2069169611 magId "2069169611" @default.
- W2069169611 workType "article" @default.