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- W2069356502 abstract "The performance of W/Pt/doping element/Pd and Pt/doping element/Pd ohmic contacts has been investigated, where Ge, Si, and Sn were employed as doping elements. The contacts were deposited by vacuum sputtering on n<SUP>+</SUP>-GaAs substrate plates and GaAs or AlGaAs epitaxial layers, then annealed by a power YAG:Nd laser. The influence of the doping elements on the parameters for ohmic contacts was not significant, with germanium being the best, we obtained a minimum value of r<SUB>c</SUB> equals 5 X 10<SUP>-6</SUP> (Omega) cm<SUP>2</SUP>. The layers of GaAs and AlGaAs were prepared with (delta) -doping by MOVPE epitaxial growth method. The minimal values of contact resistivities of 1.1 X 10<SUP>-4</SUP> (Omega) cm<SUP>2</SUP> and 7.35 X (Omega) cm<SUP>2</SUP> were achieved." @default.
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- W2069356502 date "1999-12-29" @default.
- W2069356502 modified "2023-09-26" @default.
- W2069356502 title "Laser technology in the preparation of Pt/doping element/Pd/n+-GaAs contacts" @default.
- W2069356502 doi "https://doi.org/10.1117/12.373635" @default.
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