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- W2069371124 endingPage "L693" @default.
- W2069371124 startingPage "L693" @default.
- W2069371124 abstract "Carbon nanotube (CNT) films were grown using microwave plasma-enhanced chemical vapor deposition. Catalytic cobalt (Co) nanoparticles were deposited on a silicon substrate using pulsed arc deposition. A titanium nitride (TiN) thin film was used as a buffer layer on the substrate in order to prevent the formation of Co silicide. A dense, vertically aligned, double-walled CNT (DWNT) film was grown rapidly on the Co-catalyzed Si substrate. The CNTs grew at an extremely high rate of 600 nm/s during the first 10 min of growth. Dense DWNT films with thicknesses of over 500 µm were obtained in 20 min." @default.
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- W2069371124 date "2005-05-01" @default.
- W2069371124 modified "2023-09-25" @default.
- W2069371124 title "High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition" @default.
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- W2069371124 doi "https://doi.org/10.1143/jjap.44.l693" @default.
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