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- W2070000466 abstract "Although Mo/Si multilayers are now widely used in EUV lithography development programs, multilayer induced substrate stress continues to be a major issue. Standard stress values of -350 to -450 MPa, reported for Mo/Si systems produced by magnetron sputtering, induce an intolerable deformation of the surface figure of EUV optical components. Stress in e-beam deposited Mo/Si multilayers has not been reported before. At FOM Rijnhuizen, an extensive stress mitigation program has been carried out on multilayers produced by e-beam deposition and medium energy ion polishing. The stress in our standard, high reflectance Mo/Si multilayers is less than -200 MPa. Although e-beam deposition apparently halves the typical stress values obtained by sputter deposition, it is still above the allowable limit for the first lithographic system, the so-called Alpha Tool. To further reduce stress, the influence of the Mo fraction, the number of periods and the multilayer period or d-spacing has been investigated. Varying the Molybdenum fraction in e-beam deposited multilayers results in a similar dependency as reported for magnetron sputtered coatings, though at strongly reduced absolute values. Furthermore, variation of the d-spacing has a small influence on stress. The number of periods however, has no influence on the stress value in the range from 20 to 50 periods. Applying stress mitigation techniques based on adjustment of the Mo fraction, a high reflectance of above 69% at near normal incidence at 13.5 nm has been obtained for multilayers with a stress value of only -33 MPa. This has been achieved by using Mo and Si only. This stress value is sufficiently low to enable the first generations of EUVL optics." @default.
- W2070000466 created "2016-06-24" @default.
- W2070000466 creator A5013423421 @default.
- W2070000466 creator A5018553971 @default.
- W2070000466 creator A5025185970 @default.
- W2070000466 creator A5048887362 @default.
- W2070000466 creator A5063710716 @default.
- W2070000466 creator A5068919131 @default.
- W2070000466 creator A5087582416 @default.
- W2070000466 date "2003-06-13" @default.
- W2070000466 modified "2023-10-16" @default.
- W2070000466 title "Stress mitigation in Mo/Si multilayers for EUV lithography" @default.
- W2070000466 doi "https://doi.org/10.1117/12.490138" @default.
- W2070000466 hasPublicationYear "2003" @default.
- W2070000466 type Work @default.
- W2070000466 sameAs 2070000466 @default.
- W2070000466 citedByCount "16" @default.
- W2070000466 countsByYear W20700004662013 @default.
- W2070000466 countsByYear W20700004662016 @default.
- W2070000466 countsByYear W20700004662017 @default.
- W2070000466 countsByYear W20700004662019 @default.
- W2070000466 crossrefType "proceedings-article" @default.
- W2070000466 hasAuthorship W2070000466A5013423421 @default.
- W2070000466 hasAuthorship W2070000466A5018553971 @default.
- W2070000466 hasAuthorship W2070000466A5025185970 @default.
- W2070000466 hasAuthorship W2070000466A5048887362 @default.
- W2070000466 hasAuthorship W2070000466A5063710716 @default.
- W2070000466 hasAuthorship W2070000466A5068919131 @default.
- W2070000466 hasAuthorship W2070000466A5087582416 @default.
- W2070000466 hasConcept C120665830 @default.
- W2070000466 hasConcept C121332964 @default.
- W2070000466 hasConcept C138113353 @default.
- W2070000466 hasConcept C138885662 @default.
- W2070000466 hasConcept C151730666 @default.
- W2070000466 hasConcept C159985019 @default.
- W2070000466 hasConcept C162996421 @default.
- W2070000466 hasConcept C171250308 @default.
- W2070000466 hasConcept C19067145 @default.
- W2070000466 hasConcept C191897082 @default.
- W2070000466 hasConcept C192562407 @default.
- W2070000466 hasConcept C204223013 @default.
- W2070000466 hasConcept C21036866 @default.
- W2070000466 hasConcept C22423302 @default.
- W2070000466 hasConcept C2816523 @default.
- W2070000466 hasConcept C41895202 @default.
- W2070000466 hasConcept C49040817 @default.
- W2070000466 hasConcept C549387045 @default.
- W2070000466 hasConcept C61427134 @default.
- W2070000466 hasConcept C64297162 @default.
- W2070000466 hasConcept C86803240 @default.
- W2070000466 hasConceptScore W2070000466C120665830 @default.
- W2070000466 hasConceptScore W2070000466C121332964 @default.
- W2070000466 hasConceptScore W2070000466C138113353 @default.
- W2070000466 hasConceptScore W2070000466C138885662 @default.
- W2070000466 hasConceptScore W2070000466C151730666 @default.
- W2070000466 hasConceptScore W2070000466C159985019 @default.
- W2070000466 hasConceptScore W2070000466C162996421 @default.
- W2070000466 hasConceptScore W2070000466C171250308 @default.
- W2070000466 hasConceptScore W2070000466C19067145 @default.
- W2070000466 hasConceptScore W2070000466C191897082 @default.
- W2070000466 hasConceptScore W2070000466C192562407 @default.
- W2070000466 hasConceptScore W2070000466C204223013 @default.
- W2070000466 hasConceptScore W2070000466C21036866 @default.
- W2070000466 hasConceptScore W2070000466C22423302 @default.
- W2070000466 hasConceptScore W2070000466C2816523 @default.
- W2070000466 hasConceptScore W2070000466C41895202 @default.
- W2070000466 hasConceptScore W2070000466C49040817 @default.
- W2070000466 hasConceptScore W2070000466C549387045 @default.
- W2070000466 hasConceptScore W2070000466C61427134 @default.
- W2070000466 hasConceptScore W2070000466C64297162 @default.
- W2070000466 hasConceptScore W2070000466C86803240 @default.
- W2070000466 hasLocation W20700004661 @default.
- W2070000466 hasOpenAccess W2070000466 @default.
- W2070000466 hasPrimaryLocation W20700004661 @default.
- W2070000466 hasRelatedWork W1996907800 @default.
- W2070000466 hasRelatedWork W2022331525 @default.
- W2070000466 hasRelatedWork W2030970608 @default.
- W2070000466 hasRelatedWork W2062208574 @default.
- W2070000466 hasRelatedWork W2077118741 @default.
- W2070000466 hasRelatedWork W221652659 @default.
- W2070000466 hasRelatedWork W2316948141 @default.
- W2070000466 hasRelatedWork W2990131135 @default.
- W2070000466 hasRelatedWork W3053914760 @default.
- W2070000466 hasRelatedWork W3122703849 @default.
- W2070000466 isParatext "false" @default.
- W2070000466 isRetracted "false" @default.
- W2070000466 magId "2070000466" @default.
- W2070000466 workType "article" @default.