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- W2070086104 abstract "Er:Si/Al <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> superlattices are fabricated by pulsed laser deposition (PLD) technique. Photoluminescence (PL) and PL excitation spectra measurements are carried out. The annealing temperature dependent PL intensity curves are presented. The influence of Si crystallization on the Er ions luminescence shows that the thinner the Si layer, and the shorter the distance r, the better its sensitizing performance." @default.
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- W2070086104 date "2008-01-01" @default.
- W2070086104 modified "2023-09-24" @default.
- W2070086104 title "Influence of Si crystallization evolution on the Er luminescence in superlattices Er:Si /Al<inf>2</inf>O<inf>3</inf>" @default.
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- W2070086104 doi "https://doi.org/10.1109/group4.2008.4638115" @default.
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