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- W2070098211 abstract "The unsubstituted bis-β-diketonato complex of copper, Cu(acac)2 (acac pentane-3, 5-dionato), has been used to deposit both elemental copper and copper oxide thin films by metal–organic chemical vapour deposition (MOCVD). For all Cu(II) bis-β-diketonates, growth of oxygen-free layers requires the breakage of four copper–oxygen bonds present in the precursor. The influence of carrier gas composition on deposit morphology has been examined for six parameter sets: both hydrous and anhydrous streams, each for reducing (H2), inert (Ar) and oxidising (O2) environments." @default.
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- W2070098211 date "1992-04-01" @default.
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- W2070098211 title "Metal-Organic chemical vapour deposition (mocvd) growth utilising cu(acac)2 (acac pentane-3, 5-dionato) as a source for copper-containing materials: Influence of carrier gas on surface morphology" @default.
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- W2070098211 doi "https://doi.org/10.1002/amo.860010203" @default.
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