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• W2070147006 startingPage "265" @default.
• W2070147006 abstract "Nanocrystalline γ′-(Fe1−xNix)4N (x = 0.05–0.50) thin films were synthesized on single crystal Si(1 0 0) substrates by facing target (Fe and Ni) magnetron sputtering at a mixture of Ar/N2 gas discharge, and their Fe/Ni atomic ratio, structure, morphology, and magnetic properties at room temperature were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and vibrating sample magnetometer (VSM). The sputtering current for Ni target was fixed at 0.02, 0.04, 0.06, 0.08, 0.10 and 0.15 A, respectively, upon keeping the sputtering power for Fe target constant at 36 W (I = 0.10 A, U = 360 V). Via optimizing Ni concentration through varying sputtering current for Ni target, the structural stability and the soft magnetic properties for the films were improved effectively. As the Ni concentration for the films increased, their lattice parameters and saturation magnetization Ms decreased, while grain sizes increased. The coercive force Hc for the films decreased from 66 to 36 Oe as the Ni concentration increased from 0.05 to 0.36, but increased to 76 Oe with a further increase in Ni concentration up to 0.50." @default.
• W2070147006 created "2016-06-24" @default.
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• W2070147006 date "2010-04-01" @default.
• W2070147006 modified "2023-10-16" @default.
• W2070147006 title "Effect of Ni concentration on the structure and magnetic properties for nanocrystalline Fe–Ni–N thin films" @default.
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• W2070147006 doi "https://doi.org/10.1016/j.jallcom.2010.01.146" @default.
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