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• W2070526911 startingPage "212901" @default.
• W2070526911 abstract "The electrical properties of metal-oxide-semiconductor capacitors incorporating atomic layer deposited Al2O3 on n-type and p-type In0.53Ga0.47As were investigated. A clear minority carrier response was observed for both n-type and p-type Au/Ni/Al2O3/In0.53Ga0.47As devices following an optimized ammonium sulfide (NH4)2S treatment. Capacitance-voltage and conductance-voltage measurements performed at varying temperatures allowed an Arrhenius extraction of activation energies for the minority carrier response, indicating a transition from a generation-recombination regime to a diffusion controlled response." @default.
• W2070526911 created "2016-06-24" @default.
• W2070526911 creator A5046879777 @default.
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• W2070526911 date "2011-11-21" @default.
• W2070526911 modified "2023-10-16" @default.
• W2070526911 title "Analysis of the minority carrier response of <i>n</i>-type and <i>p</i>-type Au/Ni/Al₂O₃/In_0.53Ga_0.47As/InP capacitors following an optimized (NH₄)₂S treatment" @default.
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• W2070526911 doi "https://doi.org/10.1063/1.3663535" @default.
• W2070526911 hasPublicationYear "2011" @default.
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