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- W2070550703 abstract "Atomic layer doped field-effect transistors (ALD FETs) have been fabricated, in which n-type, δ-doped, and p-type doped regions are used as a conductive channel and a punchthrough stopper, respectively. It is shown that the ALD FET shows a high transconductance while the punchthrough current is sufficiently suppressed, indicating that the device is promising as a short-channel FET for the next generation of ultralarge scale integration." @default.
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- W2070550703 date "1989-05-08" @default.
- W2070550703 modified "2023-10-18" @default.
- W2070550703 title "Atomic layer doped field-effect transistor fabricated using Si molecular beam epitaxy" @default.
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- W2070550703 doi "https://doi.org/10.1063/1.101263" @default.
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