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• W2070602215 endingPage "5772" @default.
• W2070602215 startingPage "5767" @default.
• W2070602215 abstract "The dewetting pattern development of thin film of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer has been studied after ‘annealing’ in the PMMA block selective solvent vapor. Initially, typical circular dewetted holes are observed. Further annealing, however, results in the formation of fractal-like holes. The heterogeneous stress induced by the residual solvent remaining in the film after spin-coating induces the anisotropy of the polymer mobility during the annealing process, which triggers the formation of the intriguing surface patterns." @default.
• W2070602215 created "2016-06-24" @default.
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• W2070602215 date "2005-07-01" @default.
• W2070602215 modified "2023-10-16" @default.
• W2070602215 title "Solvent vapor induced dewetting in diblock copolymer thin films" @default.
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• W2070602215 doi "https://doi.org/10.1016/j.polymer.2005.05.042" @default.
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