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- W2070609270 abstract "A new suppression method for parasitic bipolar action is presented for fully depleted surface-channel nMOSFET's on SOI by using the back-side-bias-temperature (BSBT) treatment technique. This method improves subthreshold characteristics, source-drain breakdown voltage, and hot-carrier instability without degrading device characteristics. BSBT treatment can suppress the parasitic bipolar action regardless of stress bias polarity. BSBT damage to the back-side interface between buried oxide and active silicon layer was investigated using several methods. The suppression mechanism proposed is the generation of fixed charges and interface traps at the back-side interface." @default.
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- W2070609270 date "1996-01-01" @default.
- W2070609270 modified "2023-09-23" @default.
- W2070609270 title "Suppressing the parasitic bipolar action of ultra-thin SOI MOSFET's using back-side-bias-temperature treatment" @default.
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- W2070609270 doi "https://doi.org/10.1109/relphy.1996.492057" @default.
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