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- W2070734868 abstract "A novel nanoscale lateral bipolar junction transistor (LBJT) on silicon-on-insulator (SOI) with buried oxide double step (BODS) structure is proposed. Numerical simulations demonstrate that the breakdown voltage of the proposed device is significantly higher than that of the conventional device. An increase of 150% in breakdown voltage has been obtained in the proposed device. The increase in the breakdown voltage is due to the creation of an additional electric field peak in the collector drift region, leading to greater uniformity in the horizontal component of the surface electric field and hence increases in the breakdown voltage." @default.
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- W2070734868 date "2009-01-01" @default.
- W2070734868 modified "2023-09-23" @default.
- W2070734868 title "A novel nanoscale high breakdown voltage lateral bipolar junction transistor on silicon-on-insulator" @default.
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- W2070734868 doi "https://doi.org/10.1504/ijnm.2009.028109" @default.
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