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• W2070796872 abstract "Abstract Silica (SiO 2 ) is deposited onto the surface of Mo x O y /Al 2 O 3 using CVD in a fluidized bed. The resulting deposit is characterized using N 2 physisorption, inductively coupled plasma (ICP) spectrometry, 29 Si nuclear magnetic resonance (NMR) and time of flight‐secondary ion mass spectrometry (TOF‐SIMS). The ICP and physisorption results show that the amount deposited on the surface reaches a plateau value after 30‐60 min. Based on the NMR and TOF‐SIMS analysis, this plateau value corresponds to 2‐3 monolayers. The surface coverage is not uniform, and the presence of Mo on the exterior surface of Al 2 O 3 hinders the deposition of silica." @default.
• W2070796872 created "2016-06-24" @default.
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• W2070796872 date "2008-02-01" @default.
• W2070796872 modified "2023-10-11" @default.
• W2070796872 title "Characterization of SiO₂ Deposited by CVD on Mo_<i>x</i>O_<i>y</i>/Al₂O₃ using NMR and TOF‐SIMS" @default.
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• W2070796872 doi "https://doi.org/10.1002/cvde.200706642" @default.
• W2070796872 hasPublicationYear "2008" @default.
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