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• W2070914519 abstract "The characteristics of TiN thin films grown on glass substrates by very low frequency (60 Hz) PECVD were investigated along with the reactive plasma generated using a 60 Hz power source. The TiN film depositions were performed using a gaseous mixture of H2, N2 and TiCl4 onto a substrate positioned between two electrodes using a floating substrate holder with a heating unit. The substrate is electrically floated to avoid sample damages due to ion bombardment. As-grown TiN films showed a NaCl-type fcc structure with a (200) crystallographic plane, low resistivity (∼60 μΩ cm) and gold-like color. Crystallinity was improved, impurities such as O and Cl were reduced, and the atomic ratio of N/Ti became stoichiometric with the increase of substrate temperature. Particularly, no chlorine component was detected above 500 °C. Also, the N2 partial pressure strongly affected the deposition rate and ratio of N/Ti. Otherwise, impurities and crystallinity barely changed with the change of N2 pressure. The atomic ratio of N/Ti, impurities, and crystallinity of the films significantly affected the optical and electrical properties. Consequently, we produced stoichiometric Cl-free TiN films with golden color above 500 °C at 60 mTorr. The effects of temperature played an important role in controlling the film properties compared to the N2 partial pressure." @default.
• W2070914519 created "2016-06-24" @default.
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• W2070914519 date "2012-07-01" @default.
• W2070914519 modified "2023-09-26" @default.
• W2070914519 title "Characterization of TiN thin films grown by low-frequency (60 Hz) plasma enhanced chemical vapor deposition" @default.
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• W2070914519 doi "https://doi.org/10.1016/j.jpcs.2012.02.024" @default.
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