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- W2071036596 endingPage "6843" @default.
- W2071036596 startingPage "6843" @default.
- W2071036596 abstract "To increase the throughput of electron beam lithography used to fabricate sub-100-nm patterns, we developed an electron beam and deep UV intra-level mix-and-match lithography process, that uses the JBX-9300FS point-electron-beam system and a conventional KrF stepper. Pattern data preparation was improved for sub-100-nm patterns. To reduce the effect of line width variation caused by post-exposure delay on complementary metal-oxide-semiconductor (CMOS) devices, we first exposed KrF patterns and then added another post-exposure bake before the electron beam (EB) exposure. We have used this technique to expose the gate layer of sub-100-nm CMOS devices. When we set the threshold size between EB and KrF patterns at 0.16 µm, the throughput of electron beam lithography was about threefold that of the full exposure by the electron beam lithography process. Sub-50-nm CMOS devices with high drive current were successfully fabricated." @default.
- W2071036596 created "2016-06-24" @default.
- W2071036596 creator A5027052784 @default.
- W2071036596 creator A5028298135 @default.
- W2071036596 creator A5033542945 @default.
- W2071036596 creator A5043097830 @default.
- W2071036596 creator A5044481452 @default.
- W2071036596 creator A5051721192 @default.
- W2071036596 creator A5065288428 @default.
- W2071036596 date "2000-12-01" @default.
- W2071036596 modified "2023-10-16" @default.
- W2071036596 title "Intra-Level Mix-and-Match Lithography Process for Fabricating Sub-100-nm Complementary Metal-Oxide-Semiconductor Devices using the JBX-9300FS Point-Electron-Beam System" @default.
- W2071036596 cites W2001095233 @default.
- W2071036596 cites W2007296855 @default.
- W2071036596 cites W2010460075 @default.
- W2071036596 cites W2026525228 @default.
- W2071036596 cites W2039272850 @default.
- W2071036596 cites W2058607119 @default.
- W2071036596 cites W2070672330 @default.
- W2071036596 cites W2076990826 @default.
- W2071036596 cites W2078896492 @default.
- W2071036596 cites W2142362050 @default.
- W2071036596 doi "https://doi.org/10.1143/jjap.39.6843" @default.
- W2071036596 hasPublicationYear "2000" @default.
- W2071036596 type Work @default.
- W2071036596 sameAs 2071036596 @default.
- W2071036596 citedByCount "2" @default.
- W2071036596 crossrefType "journal-article" @default.
- W2071036596 hasAuthorship W2071036596A5027052784 @default.
- W2071036596 hasAuthorship W2071036596A5028298135 @default.
- W2071036596 hasAuthorship W2071036596A5033542945 @default.
- W2071036596 hasAuthorship W2071036596A5043097830 @default.
- W2071036596 hasAuthorship W2071036596A5044481452 @default.
- W2071036596 hasAuthorship W2071036596A5051721192 @default.
- W2071036596 hasAuthorship W2071036596A5065288428 @default.
- W2071036596 hasConcept C105487726 @default.
- W2071036596 hasConcept C121332964 @default.
- W2071036596 hasConcept C147120987 @default.
- W2071036596 hasConcept C163581340 @default.
- W2071036596 hasConcept C171250308 @default.
- W2071036596 hasConcept C187504802 @default.
- W2071036596 hasConcept C192562407 @default.
- W2071036596 hasConcept C200274948 @default.
- W2071036596 hasConcept C204223013 @default.
- W2071036596 hasConcept C2779227376 @default.
- W2071036596 hasConcept C41794268 @default.
- W2071036596 hasConcept C46362747 @default.
- W2071036596 hasConcept C49040817 @default.
- W2071036596 hasConcept C53524968 @default.
- W2071036596 hasConcept C62520636 @default.
- W2071036596 hasConcept C70520399 @default.
- W2071036596 hasConcept C95312477 @default.
- W2071036596 hasConceptScore W2071036596C105487726 @default.
- W2071036596 hasConceptScore W2071036596C121332964 @default.
- W2071036596 hasConceptScore W2071036596C147120987 @default.
- W2071036596 hasConceptScore W2071036596C163581340 @default.
- W2071036596 hasConceptScore W2071036596C171250308 @default.
- W2071036596 hasConceptScore W2071036596C187504802 @default.
- W2071036596 hasConceptScore W2071036596C192562407 @default.
- W2071036596 hasConceptScore W2071036596C200274948 @default.
- W2071036596 hasConceptScore W2071036596C204223013 @default.
- W2071036596 hasConceptScore W2071036596C2779227376 @default.
- W2071036596 hasConceptScore W2071036596C41794268 @default.
- W2071036596 hasConceptScore W2071036596C46362747 @default.
- W2071036596 hasConceptScore W2071036596C49040817 @default.
- W2071036596 hasConceptScore W2071036596C53524968 @default.
- W2071036596 hasConceptScore W2071036596C62520636 @default.
- W2071036596 hasConceptScore W2071036596C70520399 @default.
- W2071036596 hasConceptScore W2071036596C95312477 @default.
- W2071036596 hasIssue "12S" @default.
- W2071036596 hasLocation W20710365961 @default.
- W2071036596 hasOpenAccess W2071036596 @default.
- W2071036596 hasPrimaryLocation W20710365961 @default.
- W2071036596 hasRelatedWork W1506498111 @default.
- W2071036596 hasRelatedWork W1599891132 @default.
- W2071036596 hasRelatedWork W1980495369 @default.
- W2071036596 hasRelatedWork W1983850620 @default.
- W2071036596 hasRelatedWork W2007100303 @default.
- W2071036596 hasRelatedWork W2007789449 @default.
- W2071036596 hasRelatedWork W2022121633 @default.
- W2071036596 hasRelatedWork W2030781314 @default.
- W2071036596 hasRelatedWork W2381201749 @default.
- W2071036596 hasRelatedWork W2526528264 @default.
- W2071036596 hasVolume "39" @default.
- W2071036596 isParatext "false" @default.
- W2071036596 isRetracted "false" @default.
- W2071036596 magId "2071036596" @default.
- W2071036596 workType "article" @default.