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• W2071113967 abstract "Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species." @default.
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• W2071113967 date "2011-01-01" @default.
• W2071113967 modified "2023-10-02" @default.
• W2071113967 title "Cryogenic plasmas for controlled processing of nanoporous materials" @default.
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• W2071113967 doi "https://doi.org/10.1039/c0cp02660c" @default.
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