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- W2071130135 abstract "Hydrogenated diamond-like carbon (g-DLC:H) films were deposited on silicon on the grounded electrode of plasma enhanced chemical vapor deposition system and then annealed in Ar gas at temperatures of 300–700 °C for 7.2×103 s after being treated in H2 atmosphere at a temperature of 100 °C for 14.2×103 s. The H2-treated g-DLC:H films had approximately the same thickness, density, and refractive index as the as-deposited DLC:H films; however, their dielectric constants increased slightly with an increase in H2 gas flow rate. The thicknesses, H contents and dielectric constants of the g-DLC:H films annealed at temperatures above 500 °C became very small, even though their densities and refractive indexes of the films increased with an increase in annealing temperature. The properties of the H2-treated g-DLC:H films had approximately the same annealing temperature dependence as those of g-DLC:H films." @default.
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- W2071130135 date "2007-09-07" @default.
- W2071130135 modified "2023-09-26" @default.
- W2071130135 title "Annealing of Hydrogenated Diamond-like Carbon Films Deposited on Ground Electrode of Plasma Enhanced Chemical Vapor Deposition System" @default.
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- W2071130135 doi "https://doi.org/10.1143/jjap.46.5901" @default.
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