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• W2071178093 abstract "The dissociation of iron-boron pairs (FeB) in Czochralski silicon under strong illumination was investigated. It is found that the dissociation process shows a double exponential dependence on time. The first fast process is suggested to be caused by a positive Fe in FeB capturing two electrons and diffusion triggered by the electron-phonon interactions, while the second slow one would involve the capturing of one electron followed by temperature dependent dissociation with an activation energy of (0.21 ± 0.03) eV. The results are important for understanding and controlling the behavior of FeB in concentrator solar cells." @default.
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• W2071178093 date "2013-08-01" @default.
• W2071178093 modified "2023-09-26" @default.
• W2071178093 title "Iron-boron pair dissociation in silicon under strong illumination" @default.
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• W2071178093 doi "https://doi.org/10.1063/1.4819481" @default.
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