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- W2071453054 abstract "Abstract An account is given of an investigation into the effect of the variation of growth conditions on the carrier concentration of epitaxial GaAs. It has been found possible to produce n -type material ranging from 10 13 cm −3 to 10 15 cm −3 without deliberate doping in an apparatus which under normal conditions produces high resistivity p -type material unless doping elements are added. The technique used depends on variation of the ratio of gallium to arsenic in the furnace gas stream, which it is suggested influences the carrier concentration by controlling the number of vacancies in the crystalline layer or the mode of incorporation of an amphoteric dopant. By this means, a simplification can be achieved either in apparatus design, since no inlets are required for gaseous doping, or in apparatus operation, since the need to add small quantities of solid dopant to the source material is eliminated." @default.
- W2071453054 created "2016-06-24" @default.
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- W2071453054 date "1971-03-01" @default.
- W2071453054 modified "2023-10-04" @default.
- W2071453054 title "Variation of the carrier concentration of epitaxial GaAs without addition of dopants" @default.
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- W2071453054 doi "https://doi.org/10.1016/0038-1101(71)90031-1" @default.
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