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- W2071454768 abstract "Positron beam experiments have been performed to establish the diffusion behavior and surface branching of positrons implanted with energies varying from 0–25 keV into an epitaxially grown layer of β-SiC on a silicon substrate. The diffusion length of the positrons amounted to 42 nm. The surface branching was as follows: 30% positron emission, 30% positronium formation and 40% trapping at the surface. The energy distribution of re-emitted positrons consisted of a narrow contribution centered around 0.5 eV with a wider contribution up to 3 eV. The use of this wide band gap material for field assisted positron moderation is discussed." @default.
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- W2071454768 date "1996-12-01" @default.
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- W2071454768 title "Positron re-emission from epitaxially grown β-SiC" @default.
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- W2071454768 doi "https://doi.org/10.1016/s0168-583x(96)00685-4" @default.
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