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- W2071478901 abstract "Conventional Au-based metallization schemes for both n-InP (AuGeNi) and p-InP (AuZnNi) were studied as a function of annealing temperature. For n+-InP, a value of the specific contact resistance as low as 5 × 10−8 Ω cm2, has been obtained by optimizing the contact metallurgy structure. For p+-InP a similar very low value, 7 × 10−6 Ω cm2, has been obtained. Metallurgical investigations have shown that very low specific contact resistance in Au-based metallization schemes can be obtained by growing a certain AuIn binary phase (ϵ-phase; Au3In), thus maximizing the amount of P at the metal-InP surface for barrier-lowering metal-phosphide formations." @default.
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- W2071478901 date "1992-11-01" @default.
- W2071478901 modified "2023-10-16" @default.
- W2071478901 title "Metallurgical optimization for ohmic contacts to InP using conventional metallization schemes" @default.
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- W2071478901 doi "https://doi.org/10.1016/0167-9317(92)90131-a" @default.
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