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- W2071617481 abstract "We demonstrate the ability to produce 1000 Å thick metal containing films by using chemical vapour deposition (CVD) from Cr(CO)6, Mo(CO)6 and W(CO)6 induced by synchrotron radiation (SR). The deposition is monitored in real time and in situ using soft X-ray emission spectroscopy and total electron yield, both stimulated by the SR. This allows deposition at higher pressures than previously used for SR-induced CVD from metal hexacarbonyls, resulting in increased rates of deposition and thicker films. We have investigated the effect of pressure (in the range of 5 × 10−7to 5 × 10−4mbar) and SR intensity on film growth. Analysis of the composition of the films by soft X-ray emission, Auger depth profiling, and ESCA indicates significant levels of contamination of the metallic films by C and O, with the C predominantly in the form of metal carbide." @default.
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- W2071617481 date "1995-08-01" @default.
- W2071617481 modified "2023-10-10" @default.
- W2071617481 title "Chemical vapour deposition of Cr, Mo and W thin films induced by synchrotron radiation" @default.
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- W2071617481 doi "https://doi.org/10.1016/0042-207x(95)00132-8" @default.
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