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- W2071680093 abstract "Hydrogen desorption kinetics from a Si(100) surface grown by gas-source molecular beam epitaxy (GSMBE) using either silane or disilane has been studied with temperature-programmed-desorption (TPD) measurements. For each source gas, a series of TPD spectra was obtained from surfaces quenched from the growth at various temperatures. The TPD spectra from disilane-GSMBE-grown surfaces showed no shift in the peak temperature, while those from the silane-grown surfaces showed a peak shift towards higher temperatures by 25°C at hydrogen coverages below 0.3 ML. This shift, indicative of the presence of higher-order desorption kinetics, suggests a more isolated configuration of the adsorbed hydrogen on the silane-grown surfaces. Difference in the growth kinetics between silane and disilane is also discussed." @default.
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- W2071680093 date "1996-06-01" @default.
- W2071680093 modified "2023-10-07" @default.
- W2071680093 title "H2-TPD study on the difference in the growth kinetics between SiH4- and Si2H6-GSMBE" @default.
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- W2071680093 doi "https://doi.org/10.1016/0039-6028(96)00222-1" @default.
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