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- W2071707196 abstract "In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns." @default.
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- W2071707196 date "2007-05-01" @default.
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- W2071707196 title "Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography" @default.
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- W2071707196 doi "https://doi.org/10.1016/j.mee.2007.01.159" @default.
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