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- W2072014128 abstract "Nanocrystalline tin dioxide (SnO2) thin films of different thicknesses were fabricated on the (0001) surface of α-Al2O3 (sapphire) using femtosecond pulsed laser deposition. X-ray diffraction and transmission electron microscopy (TEM) analysis revealed that the microstructure of the films strongly depends on the film thickness. The films with a small thickness (<30 nm) are composed of nanosized columnar (100) oriented grains (3–5 nm in diameter) which grow epitaxially on the substrate with three different in-plane grain orientations. The (101) oriented grains (25 nm in diameter) appear when the film thickness becomes larger than a critical value (about 60 nm). The volume fraction of the (101) grains increases with film thickness. Cross-section TEM studies indicated that the (101) oriented grains nucleate on the top of the (100) oriented nanosized grains and show abnormal grain growth driven by surface energy minimization. As a result, the electrical transport properties are strongly dependent on the film thickness." @default.
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- W2072014128 date "2001-07-30" @default.
- W2072014128 modified "2023-09-24" @default.
- W2072014128 title "Epitaxial nanocrystalline tin dioxide thin films grown on (0001) sapphire by femtosecond pulsed laser deposition" @default.
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- W2072014128 doi "https://doi.org/10.1063/1.1386406" @default.
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