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- W2072269439 abstract "The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A +/- 5 A/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer." @default.
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- W2072269439 date "1977-06-01" @default.
- W2072269439 modified "2023-10-16" @default.
- W2072269439 title "Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist" @default.
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- W2072269439 doi "https://doi.org/10.1364/ao.16.001633" @default.
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