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• W2072428375 abstract "The purpose of this work has been to demonstrate a simple chemical vapor deposition (CVD) technique that employs easily handled solid metal carbonyls as precursors for the formation of metallic thin films. Co, Fe, Ru, and Os metallic thin films were deposited in a chemical vapor deposition (CVD) apparatus under a vacuum of 10-5 Torr using Co2(CO)8, Fe3(CO)12, Ru3(CO)12, and Os3(CO)12 at 150, 200, 175, and 225 °C, respectively. FeCo3 and FeRu3 metal alloy films were deposited from HFeCo3(CO)12 and H2FeRu3(CO)13 at 150 and 200 °C, respectively. A Co/Ru/Co multilayer film was prepared by consecutively depositing each layer from the respective carbonyls at the aforementioned temperatures. The method employed differs from previously reported procedures in that a carrier gas is not used, but a dynamic vacuum of 10-5 Torr is found sufficient to transport the precursor metal carbonyls to the heated substrate. The precursor carbonyls Co2(CO)8, Fe3(CO)12, and H2FeRu3(CO)13, were sufficiently volatile that they could be maintained at room temperature. HFeCo3(CO)12 and Os3(CO)12 were maintained at 50 °C while Ru3(CO)12 was held at 75 °C. The films were characterized by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), and stylus profilometry." @default.
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• W2072428375 date "1997-05-01" @default.
• W2072428375 modified "2023-10-10" @default.
• W2072428375 title "Chemical Vapor Deposition of Metallic Thin Films Using Homonuclear and Heteronuclear Metal Carbonyls" @default.
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• W2072428375 doi "https://doi.org/10.1021/cm9605330" @default.
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