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- W2072442756 abstract "The paper presents computational studies of working medium dynamics during the impulse plasma deposition (IPD) process when the electric discharge in an interelectrode region is initiated by a gas introduced through a fast-acting valve. During the computational simulations the influence of different discharge parameters on the plasma dynamics was studied. The optimization of the device includes the calculation of the current sheath movement and the sensibility analysis of its dynamics to geometrical and operational parameters. It was found that gas injection can be considered as a useful tool in optimization of the coatings obtained with the IPD technique. Computer simulation results indicate the direction of changes in the development and application of the analysed surface engineering method." @default.
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- W2072442756 date "2014-05-01" @default.
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- W2072442756 title "Computational modelling of discharges within the impulse plasma deposition accelerator with a gas valve" @default.
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- W2072442756 doi "https://doi.org/10.1088/0031-8949/2014/t161/014049" @default.
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