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- W2072667029 abstract "Abstract The optical contrast at the semiconductor-metal transition (65 °C) in VO2 thin films can be dramatically increased when they are reactively evaporated at 3 nm min-1, 590 °C and under oxygen at 12 mTorr. The anomalous behavior is strongest at 1.5–2.0 eV (red light), where the transmittance for a metallic film 200 nm thick is five times higher than the semiconductor's, instead of the expected 50% decrease. Deliberate gradients in vanadium flux and substrate temperature, post- deposition oxidation and reduction, microscopic examination, optical modelling and the phase diagram consistently support the conclusion that these new type II VO2 films are more stoichiometric than previous type I films." @default.
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- W2072667029 date "1987-03-01" @default.
- W2072667029 modified "2023-09-27" @default.
- W2072667029 title "High optical contrast in VO2 thin films due to improved stoichiometry" @default.
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- W2072667029 doi "https://doi.org/10.1016/0040-6090(87)90277-x" @default.
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