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- W2072769337 abstract "We developed a technology for deposition of metal contacts/wires upon nanoporous InP thin film structures and RF sputtered InP films. Indium phosphide (InP) films were deposited onto glass substrate using RF magnetron sputtering by varying the substrate temperature (50-100°C), under constant argon pressure (6.3·10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>-3</sup> Bar) and RF power (40-100 W)." @default.
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- W2072769337 date "2013-10-01" @default.
- W2072769337 modified "2023-10-18" @default.
- W2072769337 title "Porous and RF sputtering InP for portable THz-TDS in pharmaceutical and medical applications" @default.
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- W2072769337 doi "https://doi.org/10.1109/smicnd.2013.6688092" @default.
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