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- W2073035963 abstract "Absorption data from applied ac fields in Anderson-localized amorphous indium-oxide (InxO) films are shown to be frequency and disorder dependent. The absorption shows a roll-off at a frequency which is much lower than the electron-electron scattering rate of the material when it is in the diffusive regime. This is interpreted as evidence for discreteness of the energy spectrum of the deeply localized regime. This is consistent with recent many-body localization scenarios. As the metal-insulator transition is approached, the absorption shifts to higher frequencies. Comparing with the previously obtained results on the crystalline version of indium-oxide (In2O3−x) implies a considerably higher inelastic electron-phonon scattering rate in the amorphous material. The range over which the absorption versus frequency decreases may indicate that a wide distribution of localization length is a common feature in these systems." @default.
- W2073035963 created "2016-06-24" @default.
- W2073035963 creator A5062221399 @default.
- W2073035963 date "2014-01-01" @default.
- W2073035963 modified "2023-09-23" @default.
- W2073035963 title "Absorption of ac fields in amorphous indium-oxide films" @default.
- W2073035963 doi "https://doi.org/10.1063/1.4893504" @default.
- W2073035963 hasPublicationYear "2014" @default.
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