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- W2073074210 abstract "Thermally grown silicon dioxide films on silicon were examined for time dependent, breakdown. Measurements were performed on MOS capacitors with 1100 A oxide thickness with positive voltage on the metal. A time dependent breakdown mechanism was found, which could be described as a time to breakdown, τBD and a maximum breakdown probability, reached at. times much larger than τBD. It was furthermore found that τBD could be written τBD~exp (Qo — ∞ √E)/kT and that 25 V appeared to be a lower limit of the breakdown voltage. A possible explanation is proposed. Sodium tons are assumed to drift to the silicon surface, piling up at that surface, thus lowering the barrier for Fowler-Nordheim electron injection." @default.
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- W2073074210 date "1975-01-01" @default.
- W2073074210 modified "2023-10-02" @default.
- W2073074210 title "Time dependent breakdown in silicon dioxide films†" @default.
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- W2073074210 doi "https://doi.org/10.1080/00207217508920378" @default.
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