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- W2073231968 abstract "Plasma immersion ion implantation (PI3) is a new hybrid technology using elements of ion implantation as well as plasma nitriding. In addition, and due to the high energetic ion bombardment, thermal diffusion can be used to obtain thicker layers than in conventional ion implantation. Furthermore, the process can be used in an ion beam enchanced deposition (IBED) mode to produce various kinds of coatings. This enables the treatment to be adapted to the material structure and state and also to the intended service conditions. Furthermore, economic aspects make PI3 an interesting technique for surface modification of a wide range of materials. An overview of the worldwide activities in the treatment of components and the achieved improvements will be given." @default.
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- W2073231968 date "1997-09-01" @default.
- W2073231968 modified "2023-09-24" @default.
- W2073231968 title "Industrial applications of plasma immersion ion implantation" @default.
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