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- W2073324335 abstract "Abstract In this work spectroscopic ellipsometry is used as a technique for crystal surface analysis, here applied to the study of Sb 4 adsorption on silicon (111). Perfect initial Si(111) surfaces are obtained by removing a 150 A thick oxide at high temperature under a silicon flux. This cleaning is controlled in real time by ellipsometry. Sb 4 adsorption-desorption kinetics in the monolayer range are thus presented, varying the incident antimony flux and substrate temperature. Adsorption kinetics at low substrate temperature allow calibration of the antimony flux impinging on the substrate. In all cases the desorption is found to be described by an Arrhenius law which is typical of a monomer Sb evaporation from the substrate. Moreover, the study of the adsorption kinetics and coverages at steady state shows that the adsorption phenomenon can be approximated to a monomer Sb adsorption for substrate temperatures higher than 725 ° C. However, a discrepancy with the monomer adsorption model is observed below this temperature. This may be explained in terms of Sb 4 sorption and dissociation on the surface. A simple model based on first-order dissociation kinetics of adsorbed Sb 4 is proposed to explain the observations at low coverages. An activation energy analysis is proposed that allows a better understanding of the Sb 4 interaction with a silicon surface." @default.
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- W2073324335 date "1989-09-01" @default.
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- W2073324335 title "Antimony adsorption on silicon (111) analyzed in real time by in situ ellipsometry" @default.
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- W2073324335 doi "https://doi.org/10.1016/0039-6028(89)90213-6" @default.
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