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- W2073454002 abstract "Abstract The density and size of Si nanoclusters were controlled by using a newly suggested digital gas-feeding method with Si 2 H 6 source gas in a low pressure chemical vapor deposition system. The density of the Si nanoclusters increased and the size slightly changed based on the frequency of gas pulse feeding in the digital process. A new process was used in the fabrication of the Si nanocluster floating gate memory structures, which allowed the maximum program window of 6 V to be achieved. It was also found that the program window could be easily controlled through the frequency of gas pulse feeding in the Si nanocluster formation." @default.
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- W2073454002 date "2007-05-01" @default.
- W2073454002 modified "2023-09-26" @default.
- W2073454002 title "Si nanocluster growth using a digital gas-feeding method in the LPCVD system and its charge storage effect" @default.
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- W2073454002 doi "https://doi.org/10.1016/j.mseb.2007.04.009" @default.
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