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- W2073605328 abstract "The influence of x-ray irradiation on the main digital and analog parameters of triple gate silicon-on-insulator FinFETs is investigated for unstrained and uniaxially strained devices. Comparing the p- and n-MuGFET response to radiation, x-rays can be more harmful for nMuGFETs than for the p-type counterparts due to the back-interface leakage current, which is generated by the positive charges trapped in the buried oxide. However, in pMuGFETs, the radiation tends to suppress the parasitic back-conduction, resulting in an improvement of the device performance." @default.
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- W2073605328 date "2014-11-13" @default.
- W2073605328 modified "2023-09-26" @default.
- W2073605328 title "Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation" @default.
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- W2073605328 doi "https://doi.org/10.1088/0268-1242/29/12/125015" @default.
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